Making full use of hemisphere diffuse reflection structure; can flash out high-uniformity and high-intensity light; suitable for the inspection of objects which is uneven and light-reflecting.
1.High uniformity, large emitting area.
2.Lightweight design, high luminance.
3.Frame fixed method, more uniform stress, more fastness and more reliable when long time using.
4.Flexible outline, can be customized.
1.Reflect light, unflatness surface inspection.
2.IC surface character inspection.
3.Condenser surface defect inspection.
Model:LTS-3DM198-W
Imaging instance: IC chip defect inspection
Coding rule
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LTS-3DM116-R/BGW | / | Outer dia. φ116mm,Inner dia. φ25mm,Height 52.41mm | 24V | 6.5W/11.6W |
LTS-3DM175-R/BGW | / | Outer dia. φ175mm,Inner dia. φ35mm,Height 76.93mm | 24V | 7.2W/12.0W |
LTS-3DM198-R/BGW | / | Outer dia. φ198mm,Inner dia. φ30mm,Height 88.48mm | 24V | 12.5W/21.2W |
LTS-3DM260-R/BGW | / | Outer dia. φ260mm,Inner dia. φ48mm,Height 118.98mm | 24V | 17.3W/28.8W |
* UV & IR light can be customized as required. |